Display options
Cite
Hu H, Yeom J, Mensing G, et al. Nano-fabrication with a flexible array of nano-apertures. Nanotechnology. 2012;23(17):175303doi: 10.1088/0957-4484/23/17/175303.
Hu, H., Yeom, J., Mensing, G., Chen, Y., Shannon, M. A., & King, W. P. (2012). Nano-fabrication with a flexible array of nano-apertures. Nanotechnology, 23(17), 175303. https://doi.org/10.1088/0957-4484/23/17/175303
Hu, Huan, et al. "Nano-fabrication with a flexible array of nano-apertures." Nanotechnology vol. 23,17 (2012): 175303. doi: https://doi.org/10.1088/0957-4484/23/17/175303
Hu H, Yeom J, Mensing G, Chen Y, Shannon MA, King WP. Nano-fabrication with a flexible array of nano-apertures. Nanotechnology. 2012 May 04;23(17):175303. doi: 10.1088/0957-4484/23/17/175303. Epub 2012 Apr 05. PMID: 22481526.
Copy Download .nbib Format: NLM
Share it on

Nanotechnology. 2012 May 04;23(17):175303. doi: 10.1088/0957-4484/23/17/175303. Epub 2012 Apr 05.

Nano-fabrication with a flexible array of nano-apertures.

Nanotechnology

Huan Hu, Junghoon Yeom, Glennys Mensing, Yaofeng Chen, Mark A Shannon, William P King

Affiliations

  1. Department of Electrical and Computer Engineering, University of Illinois at Urbana-Champaign, Urbana, IL 61801, USA.

PMID: 22481526 DOI: 10.1088/0957-4484/23/17/175303

Abstract

We report fabrication and use of a flexible array of nano-apertures for photolithography on curved surfaces. The batch-fabricated apertures are formed of metal-coated silicone tips. The apertures are formed at the end of the silicone tips by either electrochemical etching of the metal or plasma etching of a protective mask followed by wet chemical etching. The apertures are as small as 250 nm on substrates larger than several millimeters. We demonstrate how the nano-aperture array can be used for nano-fabrication on flat and curved substrates, and show the subsequent fabrication steps to form large arrays of sub-micron aluminum dots or vertical silicon wires.

Publication Types