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Richter AG, Yu C, Datta A, et al. In situ and interrupted-growth studies of the self-assembly of octadecyltrichlorosilane monolayers. Phys Rev E Stat Phys Plasmas Fluids Relat Interdiscip Topics. 2000;61(1):607-15doi: 10.1103/physreve.61.607.
Richter, A. G., Yu, C., Datta, A., Kmetko, J., & Dutta, P. (2000). In situ and interrupted-growth studies of the self-assembly of octadecyltrichlorosilane monolayers. Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 61(1), 607-15. https://doi.org/10.1103/physreve.61.607
Richter, et al. "In situ and interrupted-growth studies of the self-assembly of octadecyltrichlorosilane monolayers." Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics vol. 61,1 (2000): 607-15. doi: https://doi.org/10.1103/physreve.61.607
Richter AG, Yu C, Datta A, Kmetko J, Dutta P. In situ and interrupted-growth studies of the self-assembly of octadecyltrichlorosilane monolayers. Phys Rev E Stat Phys Plasmas Fluids Relat Interdiscip Topics. 2000 Jan;61(1):607-15. doi: 10.1103/physreve.61.607. PMID: 11046302.
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Phys Rev E Stat Phys Plasmas Fluids Relat Interdiscip Topics. 2000 Jan;61(1):607-15. doi: 10.1103/physreve.61.607.

In situ and interrupted-growth studies of the self-assembly of octadecyltrichlorosilane monolayers.

Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics

Richter, Yu, Datta, Kmetko, Dutta

Affiliations

  1. Department of Physics and Astronomy, Northwestern University, Evanston, Illinois 60208-3112, USA.

PMID: 11046302 DOI: 10.1103/physreve.61.607

Abstract

We have examined the self-assembly process of octadecyltrichlorosilane on silicon using x-ray reflectivity. By comparing the commonly used "interrupted-growth" characterization technique with results obtained in situ, we have determined that quenching the growth and then rinsing and drying the sample introduces free area into the film, presumably by removal of non-cross-linked (physisorbed) molecules. Reintroduction of a quenched and rinsed film to solvent does not restore the thickness of the film to its previous value. We have also performed in situ growth studies over a range of concentrations. For all concentrations, we observe growth of islands of vertical molecules. The growth follows Langmuir kinetics, except at short times for low concentration solutions.

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