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Boto AN, Kok P, Abrams DS, et al. Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit. Phys Rev Lett. 2000;85(13):2733-6doi: 10.1103/PhysRevLett.85.2733.
Boto, A. N., Kok, P., Abrams, D. S., Braunstein, S. L., Williams, C. P., & Dowling, J. P. (2000). Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit. Physical review letters, 85(13), 2733-6. https://doi.org/10.1103/PhysRevLett.85.2733
Boto, et al. "Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit." Physical review letters vol. 85,13 (2000): 2733-6. doi: https://doi.org/10.1103/PhysRevLett.85.2733
Boto AN, Kok P, Abrams DS, Braunstein SL, Williams CP, Dowling JP. Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit. Phys Rev Lett. 2000 Sep 25;85(13):2733-6. doi: 10.1103/PhysRevLett.85.2733. PMID: 10991220.
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Phys Rev Lett. 2000 Sep 25;85(13):2733-6. doi: 10.1103/PhysRevLett.85.2733.

Quantum interferometric optical lithography: exploiting entanglement to beat the diffraction limit.

Physical review letters

Boto, Kok, Abrams, Braunstein, Williams, Dowling

Affiliations

  1. Jet Propulsion Laboratory, California Institute of Technology, Mail Stop 126-347, 4800 Oak Grove Drive, Pasadena, California 91109, USA.

PMID: 10991220 DOI: 10.1103/PhysRevLett.85.2733

Abstract

Classical optical lithography is diffraction limited to writing features of a size lambda/2 or greater, where lambda is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size lambda/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method.

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