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Vailionis A, Cho B, Glass G, et al. Pathway for the strain-driven two-dimensional to three-dimensional transition during growth of Ge on Si(001). Phys Rev Lett. 2000;85(17):3672-5doi: 10.1103/PhysRevLett.85.3672.
Vailionis, A., Cho, B., Glass, G., Desjardins, P., Cahill, D. G., & Greene, J. E. (2000). Pathway for the strain-driven two-dimensional to three-dimensional transition during growth of Ge on Si(001). Physical review letters, 85(17), 3672-5. https://doi.org/10.1103/PhysRevLett.85.3672
Vailionis, et al. "Pathway for the strain-driven two-dimensional to three-dimensional transition during growth of Ge on Si(001)." Physical review letters vol. 85,17 (2000): 3672-5. doi: https://doi.org/10.1103/PhysRevLett.85.3672
Vailionis A, Cho B, Glass G, Desjardins P, Cahill DG, Greene JE. Pathway for the strain-driven two-dimensional to three-dimensional transition during growth of Ge on Si(001). Phys Rev Lett. 2000 Oct 23;85(17):3672-5. doi: 10.1103/PhysRevLett.85.3672. PMID: 11030978.
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