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Marinica DC, Ramseyer C, Borisov AG, et al. Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system. Phys Rev Lett. 2002;89(4):046802doi: 10.1103/PhysRevLett.89.046802.
Marinica, D. C., Ramseyer, C., Borisov, A. G., Teillet-Billy, D., Gauyacq, J. P., Berthold, W., Feulner, P., & Höfer, U. (2002). Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system. Physical review letters, 89(4), 046802. https://doi.org/10.1103/PhysRevLett.89.046802
Marinica, D C, et al. "Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system." Physical review letters vol. 89,4 (2002): 046802. doi: https://doi.org/10.1103/PhysRevLett.89.046802
Marinica DC, Ramseyer C, Borisov AG, Teillet-Billy D, Gauyacq JP, Berthold W, Feulner P, Höfer U. Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system. Phys Rev Lett. 2002 Jul 22;89(4):046802. doi: 10.1103/PhysRevLett.89.046802. Epub 2002 Jul 03. PMID: 12144494.
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Phys Rev Lett. 2002 Jul 22;89(4):046802. doi: 10.1103/PhysRevLett.89.046802. Epub 2002 Jul 03.

Effect of an atomically thin dielectric film on the surface electron dynamics: image-potential states in the Ar/Cu(100) system.

Physical review letters

D C Marinica, C Ramseyer, A G Borisov, D Teillet-Billy, J P Gauyacq, W Berthold, P Feulner, U Höfer

Affiliations

  1. Laboratoire des Collisions Atomiques et Moléculaires, UMR CNRS-Université Paris-Sud 8625, Bâtiment 351, Université Paris-Sud, 91405 Orsay Cedex, France.

PMID: 12144494 DOI: 10.1103/PhysRevLett.89.046802

Abstract

The effect of an atomically thin Ar layer on the image-potential states on Cu(100) surfaces is studied in a joint experimental-theoretical study, allowing a detailed analysis of the interaction between a surface electron and a thin insulator layer. A microscopic theoretical description of the Ar layer is developed based on mutually polarizing Ar atoms. Account of the 3D Ar layer structure allows one to predict energies and lifetimes of the image states in excellent agreement with the observations. The Ar layer, even as thin as one monolayer, is efficiently insulating the state from the metal.

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