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Appl Opt. 2003 Aug 01;42(22):4580-3. doi: 10.1364/ao.42.004580.

Evaluation of the oxidation of TiO2 films during reactive evaporation of Ti3O5 and during exposure of the films to the atmosphere.

Applied optics

Robert Linsbod, Elmar Ritter, Klaus Leitner

Affiliations

  1. Umicore Materials R&D Laboratory, FL-9496 Balzers, Principality of Liechtenstein.

PMID: 12916624 DOI: 10.1364/ao.42.004580

Abstract

A surplus amount of oxygen is needed to produce titanium dioxide film by reactive electron-beam evaporation of Ti3O5. We investigated the ratio of the rates at which oxygen molecules and TiO(x) molecules impinge upon substrates at 25 degrees and 250 degrees C to produce TiO2 filmsthat show no optical absorption in the visible spectral region. On unheated substrates the ratio was 49, and at 250 degrees C it was 26, provided that the substrates had been exposed to air after being coated at the given substrate temperature. Higher ratios were required if the TiOs film was covered with a SiO2 film, which impeded further oxidation. Furthermore, the postdeposition oxidation behavior of these films was studied.

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