Display options
Cite
Rolland JP, Hagberg EC, Denison GM, et al. High-resolution soft lithography: enabling materials for nanotechnologies. Angew Chem Int Ed Engl. 2004;43(43):5796-9doi: 10.1002/anie.200461122.
Rolland, J. P., Hagberg, E. C., Denison, G. M., Carter, K. R., & De Simone, J. M. (2004). High-resolution soft lithography: enabling materials for nanotechnologies. Angewandte Chemie (International ed. in English), 43(43), 5796-9. https://doi.org/10.1002/anie.200461122
Rolland, Jason P, et al. "High-resolution soft lithography: enabling materials for nanotechnologies." Angewandte Chemie (International ed. in English) vol. 43,43 (2004): 5796-9. doi: https://doi.org/10.1002/anie.200461122
Rolland JP, Hagberg EC, Denison GM, Carter KR, De Simone JM. High-resolution soft lithography: enabling materials for nanotechnologies. Angew Chem Int Ed Engl. 2004 Nov 05;43(43):5796-9. doi: 10.1002/anie.200461122. PMID: 15478218.
Copy Download .nbib Format: NLM
Share it on

Angew Chem Int Ed Engl. 2004 Nov 05;43(43):5796-9. doi: 10.1002/anie.200461122.

High-resolution soft lithography: enabling materials for nanotechnologies.

Angewandte Chemie (International ed. in English)

Jason P Rolland, Erik C Hagberg, Ginger M Denison, Kenneth R Carter, Joseph M De Simone

Affiliations

  1. Department of Chemistry, University of North Carolina at Chapel Hill, Chapel Hill, NC, 27599, USA.

PMID: 15478218 DOI: 10.1002/anie.200461122

[No abstract available.]

Publication Types