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Langmuir. 2006 Jan 03;22(1):116-26. doi: 10.1021/la051419b.

Nanoscale wettability of self-assembled monolayers investigated by noncontact atomic force microscopy.

Langmuir : the ACS journal of surfaces and colloids

Antonio Checco, Hauke Schollmeyer, Jean Daillant, Patrick Guenoun, Rabah Boukherroub

Affiliations

  1. Service de Physique de l'Etat Condensé, C.E.A. Saclay, F-91191 Gif-sur-Yvette Cedex, France.

PMID: 16378409 DOI: 10.1021/la051419b

Abstract

We report on a novel technique to nucleate nanometer-sized droplets on a solid substrate and to image them with minimal perturbation by noncontact atomic force microscopy (NC-AFM). The drop size can be accurately controlled, thus permitting hysteresis measurements. We have studied the nanoscale wettability of several methyl-terminated substrates prepared by the self-assembly of organic molecules. These substrates are alkyltrichlorosilanes on silica, alkylthiols on gold, alkyl chains on hydrogen-terminated silicon, and crystalline hexatriacontane chains on silica. For each of these systems, we report a deviation of the wetting contact angle from the macroscopic value, and we discuss this effect in term of mesoscale surface heterogeneity and long-range solid-liquid interactions.

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