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Becerra R, Cannady JP, Walsh R. Time-resolved gas-phase kinetic and quantum chemical studies of reactions of silylene with chlorine-containing species. 2. CH3Cl. J Phys Chem A. 2006;110(21):6680-6doi: 10.1021/jp055885l.
Becerra, R., Cannady, J. P., & Walsh, R. (2006). Time-resolved gas-phase kinetic and quantum chemical studies of reactions of silylene with chlorine-containing species. 2. CH3Cl. The journal of physical chemistry. A, 110(21), 6680-6. https://doi.org/10.1021/jp055885l
Becerra, Rosa, et al. "Time-resolved gas-phase kinetic and quantum chemical studies of reactions of silylene with chlorine-containing species. 2. CH3Cl." The journal of physical chemistry. A vol. 110,21 (2006): 6680-6. doi: https://doi.org/10.1021/jp055885l
Becerra R, Cannady JP, Walsh R. Time-resolved gas-phase kinetic and quantum chemical studies of reactions of silylene with chlorine-containing species. 2. CH3Cl. J Phys Chem A. 2006 Jun 01;110(21):6680-6. doi: 10.1021/jp055885l. PMID: 16722683.
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J Phys Chem A. 2006 Jun 01;110(21):6680-6. doi: 10.1021/jp055885l.

Time-resolved gas-phase kinetic and quantum chemical studies of reactions of silylene with chlorine-containing species. 2. CH3Cl.

The journal of physical chemistry. A

Rosa Becerra, J Pat Cannady, Robin Walsh

Affiliations

  1. Instituto de Quimica-Fisica Rocasolano, C.S.I.C., C/Serrano 119, 28006 Madrid, Spain.

PMID: 16722683 DOI: 10.1021/jp055885l

Abstract

Time-resolved kinetic studies of the reaction of silylene, SiH2, generated by laser flash photolysis of both silacyclopent-3-ene and phenylsilane, have been carried out to obtain second-order rate constants for its reaction with CH3Cl. The reaction was studied in the gas phase at six temperatures in the range 294-606 K. The second-order rate constants gave a curved Arrhenius plot with a minimum value at T approximately 370 K. The reaction showed no pressure dependence in the presence of up to 100 Torr SF6. The rate constants, however, showed a weak dependence on laser pulse energy. This suggests an interpretation requiring more than one contributing reaction pathway to SiH2 removal. Apart from a direct reaction of SiH2 with CH3Cl, reaction of SiH2 with CH3 (formed by photodissociation of CH3Cl) seems probable, with contributions of up to 30% to the rates. Ab initio calculations (G3 level) show that the initial step of reaction of SiH2 with CH3Cl is formation of a zwitterionic complex (ylid), but a high-energy barrier rules out the subsequent insertion step. On the other hand, the Cl-abstraction reaction leading to CH3 + ClSiH2 has a low barrier, and therefore, this seems the most likely candidate for the main reaction pathway of SiH2 with CH3Cl. RRKM calculations on the abstraction pathway show that this process alone cannot account for the observed temperature dependence of the rate constants. The data are discussed in light of studies of other silylene reactions with haloalkanes.

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