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Zubkov T, Lucassen AC, Freeman D, et al. Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. J Phys Chem B. 2005;109(29):14144-53doi: 10.1021/jp0517854.
Zubkov, T., Lucassen, A. C., Freeman, D., Feldman, Y., Cohen, S. R., Evmenenko, G., Dutta, P., & van der Boom, M. E. (2005). Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. The journal of physical chemistry. B, 109(29), 14144-53. https://doi.org/10.1021/jp0517854
Zubkov, Tatiana, et al. "Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers." The journal of physical chemistry. B vol. 109,29 (2005): 14144-53. doi: https://doi.org/10.1021/jp0517854
Zubkov T, Lucassen AC, Freeman D, Feldman Y, Cohen SR, Evmenenko G, Dutta P, van der Boom ME. Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers. J Phys Chem B. 2005 Jul 28;109(29):14144-53. doi: 10.1021/jp0517854. PMID: 16852776.
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J Phys Chem B. 2005 Jul 28;109(29):14144-53. doi: 10.1021/jp0517854.

Photoinduced deprotection and ZnO patterning of hydroxyl-terminated siloxane-based monolayers.

The journal of physical chemistry. B

Tatiana Zubkov, André C B Lucassen, Dalia Freeman, Yishay Feldman, Sidney R Cohen, Guennadi Evmenenko, Pulak Dutta, M E van der Boom

Affiliations

  1. Department of Organic Chemistry, Department of Chemical Research Support, The Weizmann Institute of Science, Rehovot 76100, Israel.

PMID: 16852776 DOI: 10.1021/jp0517854

Abstract

Trimethoxy-[11-(2-nitrobenzyloxy)undecyl]silane (1) and trimethoxy-[17-(2-nitrobenzyloxy)heptadecyl]silane (2) have been used for the covalent assembly of siloxane-based photopatternable monolayers. Exposing the monolayers to UV light (312 +/- 10 nm) results in the generation of reactive hydroxyl-terminated monolayers without affecting the film quality. The new monolayers, deprotection chemistry, and the effect of photoinduced headgroup lift-off on the monolayer microstructure have been studied in detail by a full complement of physicochemical techniques, including optical (UV-vis) spectroscopy, ellipsometry, aqueous contact angle (CA) measurements, X-ray photoelectron spectroscopy (XPS), synchrotron X-ray reflectivity (XRR), and atomic force microscopy (AFM and AFM-force spectroscopy). AFM-force spectroscopy was used to analyze hydrogen-bond interactions as a function of the nature of the solid-liquid interface. AFM-force spectroscopy indicates a hydrogen-bond energy for photodeprotected monolayers of 8.2 kJ mol(-1) (approximately 2 kcal mol(-1)). Scanning electron microscopy (SEM) revealed that treatment of photopatterned monolayers with ZnEt2 solutions resulted in well-defined approximately 2 microm x 2 microm features of 10 A thick ZnO layers.

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