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Bergmann K, Schriever G, Rosier O, et al. Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma. Appl Opt. 1999;38(25):5413-7doi: 10.1364/ao.38.005413.
Bergmann, K., Schriever, G., Rosier, O., Müller, M., Neff, W., & Lebert, R. (1999). Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma. Applied optics, 38(25), 5413-7. https://doi.org/10.1364/ao.38.005413
Bergmann, K, et al. "Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma." Applied optics vol. 38,25 (1999): 5413-7. doi: https://doi.org/10.1364/ao.38.005413
Bergmann K, Schriever G, Rosier O, Müller M, Neff W, Lebert R. Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma. Appl Opt. 1999 Sep 01;38(25):5413-7. doi: 10.1364/ao.38.005413. PMID: 18324046.
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Appl Opt. 1999 Sep 01;38(25):5413-7. doi: 10.1364/ao.38.005413.

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma.

Applied optics

K Bergmann, G Schriever, O Rosier, M Müller, W Neff, R Lebert

Affiliations

  1. Lehrstuhl für Lasertechnik, Rheinisch-Westfälische Technische Hochschule Aachen, Steinbachstrasse 15, D-52074 Aachen, Germany. [email protected]

PMID: 18324046 DOI: 10.1364/ao.38.005413

Abstract

An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode geometry, which allows for omitting a switch between the storage capacity and the electrode system and for low inductive coupling of the electrically stored energy to the plasma. Thus energies of only a few joules are sufficient to create current pulses in the range of several kiloamperes, which lead to a compression and a heating of the plasmas to electron densities of more than 10(17) cm(-3) and temperatures of several tens of electron volts, which is necessary for emission in the EUV range. As an example, the emission spectrum of an oxygen plasma in the 11-18-nm range is presented. Transitions of beryllium- and lithium-like oxygen ions can be identified. Current waveform and time-resolved measurements of the EUV emission are discussed. In initial experiments a repetitive operation at nearly 0.2 kHz could be demonstrated. Additionally, the broadband emission of a xenon plasma generated in a 2.2-J discharge is presented.

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