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Neipp C, Pascual I, Beléndez A. Effects of overmodulation in fixation-free rehalogenating bleached holograms. Appl Opt. 2001;40(20):3402-8doi: 10.1364/ao.40.003402.
Neipp, C., Pascual, I., & Beléndez, A. (2001). Effects of overmodulation in fixation-free rehalogenating bleached holograms. Applied optics, 40(20), 3402-8. https://doi.org/10.1364/ao.40.003402
Neipp, C, et al. "Effects of overmodulation in fixation-free rehalogenating bleached holograms." Applied optics vol. 40,20 (2001): 3402-8. doi: https://doi.org/10.1364/ao.40.003402
Neipp C, Pascual I, Beléndez A. Effects of overmodulation in fixation-free rehalogenating bleached holograms. Appl Opt. 2001 Jul 10;40(20):3402-8. doi: 10.1364/ao.40.003402. PMID: 18360366.
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Appl Opt. 2001 Jul 10;40(20):3402-8. doi: 10.1364/ao.40.003402.

Effects of overmodulation in fixation-free rehalogenating bleached holograms.

Applied optics

C Neipp, I Pascual, A Beléndez

PMID: 18360366 DOI: 10.1364/ao.40.003402

Abstract

The mechanism for hologram formation by fixation-free rehalogenating bleaching has been treated by several authors. Experiments carried out with Kodak and Agfa photographic plates have led to the conclusion that the transfer of material from the exposed to the unexposed zones is the main mechanism that drives the process. We show that when BB-640 emulsion is used in the recording of holograms by means of fixation-free rehalogenating bleaching, the mechanism for the transfer of material from exposed to unexposed zones is efficient enough to create high refractive-index modulations. We also comment on the overmodulation effects, which result in a decrease in diffraction efficiency.

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