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Huang H, Dell JM, Liu S. Nanostructural characteristics and mechanical properties of low temperature plasma enhanced chemical vapor deposited silicon nitride thin films. J Nanosci Nanotechnol. 2009;9(6):3734-41doi: 10.1166/jnn.2009.ns59.
Huang, H., Dell, J. M., & Liu, S. (2009). Nanostructural characteristics and mechanical properties of low temperature plasma enhanced chemical vapor deposited silicon nitride thin films. Journal of nanoscience and nanotechnology, 9(6), 3734-41. https://doi.org/10.1166/jnn.2009.ns59
Huang, H, et al. "Nanostructural characteristics and mechanical properties of low temperature plasma enhanced chemical vapor deposited silicon nitride thin films." Journal of nanoscience and nanotechnology vol. 9,6 (2009): 3734-41. doi: https://doi.org/10.1166/jnn.2009.ns59
Huang H, Dell JM, Liu S. Nanostructural characteristics and mechanical properties of low temperature plasma enhanced chemical vapor deposited silicon nitride thin films. J Nanosci Nanotechnol. 2009 Jun;9(6):3734-41. doi: 10.1166/jnn.2009.ns59. PMID: 19504911.
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