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Politano A, Agostino RG, Colavita E, et al. Collective excitations in nanoscale thin alkali films: Na/Cu(111). J Nanosci Nanotechnol. 2009;9(6):3932-7doi: 10.1166/jnn.2009.ns92.
Politano, A., Agostino, R. G., Colavita, E., Formoso, V., & Chiarello, G. (2009). Collective excitations in nanoscale thin alkali films: Na/Cu(111). Journal of nanoscience and nanotechnology, 9(6), 3932-7. https://doi.org/10.1166/jnn.2009.ns92
Politano, A, et al. "Collective excitations in nanoscale thin alkali films: Na/Cu(111)." Journal of nanoscience and nanotechnology vol. 9,6 (2009): 3932-7. doi: https://doi.org/10.1166/jnn.2009.ns92
Politano A, Agostino RG, Colavita E, Formoso V, Chiarello G. Collective excitations in nanoscale thin alkali films: Na/Cu(111). J Nanosci Nanotechnol. 2009 Jun;9(6):3932-7. doi: 10.1166/jnn.2009.ns92. PMID: 19504944.
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J Nanosci Nanotechnol. 2009 Jun;9(6):3932-7. doi: 10.1166/jnn.2009.ns92.

Collective excitations in nanoscale thin alkali films: Na/Cu(111).

Journal of nanoscience and nanotechnology

A Politano, R G Agostino, E Colavita, V Formoso, G Chiarello

Affiliations

  1. Dipartimento di Fisica and Consorzio Nazionale Interuniversitario per le Scienze Fisiche della Materia, Università della Calabria, 1-87036 Arcavacata di Rende, CS, Italy.

PMID: 19504944 DOI: 10.1166/jnn.2009.ns92

Abstract

The relationship between electron quantum confinement and the energy dispersion of the surface plasmon in nanoscale thin Na layers adsorbed on Cu(111) at room temperature have been studied by high resolution electron energy loss spectroscopy. Screening effects due to electron quantum confinement occurring in this system cause the lowering of the surface plasmon frequency and, moreover, make the energy range of its dispersion curve larger than in thick alkali films. Landau damping of the plasma excitation was unexpectedly very efficient at small momenta. The dispersion curve of the Na surface plasmon was found to depend on the primary electron beam energy. Multipole surface plasmon at 4.70 eV was observed only for higher impinging energies.

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