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Giuliani JF, Anderson WT. Elimination of micro-inhomogeneities in a ruby laser beam for improved semiconductor device processing. Appl Opt. 1981;20(15):2597-600doi: 10.1364/AO.20.002597.
Giuliani, J. F., & Anderson, W. T. (1981). Elimination of micro-inhomogeneities in a ruby laser beam for improved semiconductor device processing. Applied optics, 20(15), 2597-600. https://doi.org/10.1364/AO.20.002597
Giuliani, J F, and Anderson, W T. "Elimination of micro-inhomogeneities in a ruby laser beam for improved semiconductor device processing." Applied optics vol. 20,15 (1981): 2597-600. doi: https://doi.org/10.1364/AO.20.002597
Giuliani JF, Anderson WT. Elimination of micro-inhomogeneities in a ruby laser beam for improved semiconductor device processing. Appl Opt. 1981 Aug 01;20(15):2597-600. doi: 10.1364/AO.20.002597. PMID: 20333000.
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Appl Opt. 1981 Aug 01;20(15):2597-600. doi: 10.1364/AO.20.002597.

Elimination of micro-inhomogeneities in a ruby laser beam for improved semiconductor device processing.

Applied optics

J F Giuliani, W T Anderson

PMID: 20333000 DOI: 10.1364/AO.20.002597

[No abstract available.]

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