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de A Mello B, da Costa IF, Lima CR, et al. Developed profile of holographically exposed photoresist gratings. Appl Opt. 1995;34(4):597-603doi: 10.1364/AO.34.000597.
de A Mello, B., da Costa, I. F., Lima, C. R., & Cescato, L. (1995). Developed profile of holographically exposed photoresist gratings. Applied optics, 34(4), 597-603. https://doi.org/10.1364/AO.34.000597
de A Mello, B, et al. "Developed profile of holographically exposed photoresist gratings." Applied optics vol. 34,4 (1995): 597-603. doi: https://doi.org/10.1364/AO.34.000597
de A Mello B, da Costa IF, Lima CR, Cescato L. Developed profile of holographically exposed photoresist gratings. Appl Opt. 1995 Feb 01;34(4):597-603. doi: 10.1364/AO.34.000597. PMID: 20963156.
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Appl Opt. 1995 Feb 01;34(4):597-603. doi: 10.1364/AO.34.000597.

Developed profile of holographically exposed photoresist gratings.

Applied optics

B de A Mello, I F da Costa, C R Lima, L Cescato

PMID: 20963156 DOI: 10.1364/AO.34.000597

Abstract

A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can be used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles.

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