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Vainos NA, Mailis S, Pissadakis S, et al. Excimer laser use for microetching computer-generated holographic structures. Appl Opt. 1996;35(32):6304-19doi: 10.1364/AO.35.006304.
Vainos, N. A., Mailis, S., Pissadakis, S., Boutsikaris, L., Parmiter, P. J., Dainty, P., & Hall, T. J. (1996). Excimer laser use for microetching computer-generated holographic structures. Applied optics, 35(32), 6304-19. https://doi.org/10.1364/AO.35.006304
Vainos, N A, et al. "Excimer laser use for microetching computer-generated holographic structures." Applied optics vol. 35,32 (1996): 6304-19. doi: https://doi.org/10.1364/AO.35.006304
Vainos NA, Mailis S, Pissadakis S, Boutsikaris L, Parmiter PJ, Dainty P, Hall TJ. Excimer laser use for microetching computer-generated holographic structures. Appl Opt. 1996 Nov 10;35(32):6304-19. doi: 10.1364/AO.35.006304. PMID: 21127656.
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Appl Opt. 1996 Nov 10;35(32):6304-19. doi: 10.1364/AO.35.006304.

Excimer laser use for microetching computer-generated holographic structures.

Applied optics

N A Vainos, S Mailis, S Pissadakis, L Boutsikaris, P J Parmiter, P Dainty, T J Hall

PMID: 21127656 DOI: 10.1364/AO.35.006304

Abstract

Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method.

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