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Lee SY, Cho IH, Kim JM, et al. Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length. J Synchrotron Radiat. 2010;18:143-7doi: 10.1107/S0909049510044535.
Lee, S. Y., Cho, I. H., Kim, J. M., Kang, H. C., & Noh, D. Y. (2011). Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length. Journal of synchrotron radiation, 18143-7. https://doi.org/10.1107/S0909049510044535
Lee, S Y, et al. "Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length." Journal of synchrotron radiation vol. 18 (2011): 143-7. doi: https://doi.org/10.1107/S0909049510044535
Lee SY, Cho IH, Kim JM, Kang HC, Noh DY. Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length. J Synchrotron Radiat. 2011 Mar;18:143-7. doi: 10.1107/S0909049510044535. Epub 2010 Dec 02. PMID: 21335899.
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J Synchrotron Radiat. 2011 Mar;18:143-7. doi: 10.1107/S0909049510044535. Epub 2010 Dec 02.

Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length.

Journal of synchrotron radiation

S Y Lee, I H Cho, J M Kim, H C Kang, D Y Noh

Affiliations

  1. School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea.

PMID: 21335899 DOI: 10.1107/S0909049510044535

Abstract

Focused hard X-ray microbeams for use in X-ray nanolithography have been investigated. A 7.5 keV X-ray beam generated at an undulator was focused to about 3 µm using a Fresnel zone plate fabricated on silicon. The focused X-ray beam retains a high degree of collimation owing to the long focal length of the zone plate, which greatly facilitates hard X-ray nanoscale lithography. The focused X-ray microbeam was successfully utilized to fabricate patterns with features as small as 100 nm on a photoresist.

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