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Schoenaker FJ, Córdoba R, Fernández-Pacheco R, et al. Focused electron beam induced etching of titanium with XeF2. Nanotechnology. 2011;22(26):265304doi: 10.1088/0957-4484/22/26/265304.
Schoenaker, F. J., Córdoba, R., Fernández-Pacheco, R., Magén, C., Stéphan, O., Zuriaga-Monroy, C., Ibarra, M. R., & De Teresa, J. M. (2011). Focused electron beam induced etching of titanium with XeF2. Nanotechnology, 22(26), 265304. https://doi.org/10.1088/0957-4484/22/26/265304
Schoenaker, F J, et al. "Focused electron beam induced etching of titanium with XeF2." Nanotechnology vol. 22,26 (2011): 265304. doi: https://doi.org/10.1088/0957-4484/22/26/265304
Schoenaker FJ, Córdoba R, Fernández-Pacheco R, Magén C, Stéphan O, Zuriaga-Monroy C, Ibarra MR, De Teresa JM. Focused electron beam induced etching of titanium with XeF2. Nanotechnology. 2011 Jul 01;22(26):265304. doi: 10.1088/0957-4484/22/26/265304. Epub 2011 May 18. PMID: 21586811.
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