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Packard CE, Aidala KE, Ramanan S, et al. Patterned removal of molecular organic films by diffusion. Langmuir. 2011;27(15):9073-6doi: 10.1021/la2016929.
Packard, C. E., Aidala, K. E., Ramanan, S., & Bulović, V. (2011). Patterned removal of molecular organic films by diffusion. Langmuir : the ACS journal of surfaces and colloids, 27(15), 9073-6. https://doi.org/10.1021/la2016929
Packard, Corinne E, et al. "Patterned removal of molecular organic films by diffusion." Langmuir : the ACS journal of surfaces and colloids vol. 27,15 (2011): 9073-6. doi: https://doi.org/10.1021/la2016929
Packard CE, Aidala KE, Ramanan S, Bulović V. Patterned removal of molecular organic films by diffusion. Langmuir. 2011 Aug 02;27(15):9073-6. doi: 10.1021/la2016929. Epub 2011 Jun 28. PMID: 21699232.
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Langmuir. 2011 Aug 02;27(15):9073-6. doi: 10.1021/la2016929. Epub 2011 Jun 28.

Patterned removal of molecular organic films by diffusion.

Langmuir : the ACS journal of surfaces and colloids

Corinne E Packard, Katherine E Aidala, Sulinya Ramanan, Vladimir Bulović

Affiliations

  1. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. [email protected]

PMID: 21699232 DOI: 10.1021/la2016929

Abstract

We demonstrate that "contact patterning" subtractively patterns a wide range of molecular organic films of nanoscale thickness with nanometer-scale accuracy. In "contact patterning", an elastomeric stamp with raised features is brought into contact with the organic film and subsequently removed, generating patterns by the diffusion of the film molecules into the stamp. The mechanism of material removal via diffusion is documented over spans of minutes, hours, and days and is shown to be consistently repeatable. Contact patterning provides a photolithography-free, potentially scalable approach to subtractive patterning of a wide range of molecular organic films.

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