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Wu CY, Kuo CT, Wang CY, et al. Plasmonic green nanolaser based on a metal-oxide-semiconductor structure. Nano Lett. 2011;11(10):4256-60doi: 10.1021/nl2022477.
Wu, C. Y., Kuo, C. T., Wang, C. Y., He, C. L., Lin, M. H., Ahn, H., & Gwo, S. (2011). Plasmonic green nanolaser based on a metal-oxide-semiconductor structure. Nano letters, 11(10), 4256-60. https://doi.org/10.1021/nl2022477
Wu, Chen-Ying, et al. "Plasmonic green nanolaser based on a metal-oxide-semiconductor structure." Nano letters vol. 11,10 (2011): 4256-60. doi: https://doi.org/10.1021/nl2022477
Wu CY, Kuo CT, Wang CY, He CL, Lin MH, Ahn H, Gwo S. Plasmonic green nanolaser based on a metal-oxide-semiconductor structure. Nano Lett. 2011 Oct 12;11(10):4256-60. doi: 10.1021/nl2022477. Epub 2011 Sep 08. PMID: 21882819.
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Nano Lett. 2011 Oct 12;11(10):4256-60. doi: 10.1021/nl2022477. Epub 2011 Sep 08.

Plasmonic green nanolaser based on a metal-oxide-semiconductor structure.

Nano letters

Chen-Ying Wu, Cheng-Tai Kuo, Chun-Yuan Wang, Chieh-Lun He, Meng-Hsien Lin, Hyeyoung Ahn, Shangjr Gwo

Affiliations

  1. Department of Physics and ‡Institute of Nanoengineering and Microsystems, National Tsing-Hua University , Hsinchu, Taiwan 30013, Republic of China.

PMID: 21882819 DOI: 10.1021/nl2022477

Abstract

Realization of smaller and faster coherent light sources is critically important for the emerging applications in nanophotonics and information technology. Semiconductor lasers are arguably the most suitable candidate for such purposes. However, the minimum size of conventional semiconductor lasers utilizing dielectric optical cavities for sustaining laser oscillation is ultimately governed by the diffraction limit (∼(λ/2n)(3) for three-dimensional (3D) cavities, where λ is the free-space wavelength and n is the refractive index). Here, we demonstrate the 3D subdiffraction-limited laser operation in the green spectral region based on a metal-oxide-semiconductor (MOS) structure, comprising a bundle of green-emitting InGaN/GaN nanorods strongly coupled to a gold plate through a SiO(2) dielectric nanogap layer. In this plasmonic nanocavity structure, the analogue of MOS-type "nanocapacitor" in nanoelectronics leads to the confinement of the plasmonic field into a 3D mode volume of 8.0 × 10(-4) μm(3) (∼0.14(λ/2n)(3)).

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