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Gross H, Henn MA, Heidenreich S, et al. Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry. Appl Opt. 2012;51(30):7384-94doi: 10.1364/AO.51.007384.
Gross, H., Henn, M. A., Heidenreich, S., Rathsfeld, A., & Bär, M. (2012). Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry. Applied optics, 51(30), 7384-94. https://doi.org/10.1364/AO.51.007384
Gross, H, et al. "Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry." Applied optics vol. 51,30 (2012): 7384-94. doi: https://doi.org/10.1364/AO.51.007384
Gross H, Henn MA, Heidenreich S, Rathsfeld A, Bär M. Modeling of line roughness and its impact on the diffraction intensities and the reconstructed critical dimensions in scatterometry. Appl Opt. 2012 Oct 20;51(30):7384-94. doi: 10.1364/AO.51.007384. PMID: 23089796.
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