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Pearson AC, Linford MR, Harb JN, et al. Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies. Langmuir. 2013;29(24):7433-8doi: 10.1021/la304486x.
Pearson, A. C., Linford, M. R., Harb, J. N., & Davis, R. C. (2013). Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies. Langmuir : the ACS journal of surfaces and colloids, 29(24), 7433-8. https://doi.org/10.1021/la304486x
Pearson, Anthony C, et al. "Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies." Langmuir : the ACS journal of surfaces and colloids vol. 29,24 (2013): 7433-8. doi: https://doi.org/10.1021/la304486x
Pearson AC, Linford MR, Harb JN, Davis RC. Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies. Langmuir. 2013 Jun 18;29(24):7433-8. doi: 10.1021/la304486x. Epub 2013 Feb 12. PMID: 23342948.
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Langmuir. 2013 Jun 18;29(24):7433-8. doi: 10.1021/la304486x. Epub 2013 Feb 12.

Dual patterning of a poly(acrylic acid) layer by electron-beam and block copolymer lithographies.

Langmuir : the ACS journal of surfaces and colloids

Anthony C Pearson, Matthew R Linford, John N Harb, Robert C Davis

Affiliations

  1. Department of Physics and Astronomy, Brigham Young University, Provo, Utah, USA.

PMID: 23342948 DOI: 10.1021/la304486x

Abstract

We show the controllable patterning of palladium nanoparticles in both one and two dimensions using electron-beam lithography and reactive ion etching of a thin film of poly(acrylic acid) (PAA). After the initial patterning of the PAA, a monolayer of polystyrene-b-poly-2-vinylpyridine micelles is spun cast onto the surface. A short reactive ion etch is then used to transfer the micelle pattern into the patterned poly(acrylic acid). Finally, PdCl2 is loaded from solution into the patterned poly(acrylic acid) features, and a reactive-ion etching process is used to remove the remaining polymer and form Pd nanoparticles. This method yields location-controlled patches of nanoparticles, including single- and double-file lines and nanoparticle pairs. A locational accuracy of 9 nm or less in one direction was achieved by optimizing the size of the PAA features.

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