Cite
Shmeliov A, Kim JS, Borisenko KB, et al. Impurity induced non-bulk stacking in chemically exfoliated h-BN nanosheets. Nanoscale. 2013;5(6):2290-4doi: 10.1039/c3nr33375b.
Shmeliov, A., Kim, J. S., Borisenko, K. B., Wang, P., Okunishi, E., Shannon, M., Kirkland, A. I., Nellist, P. D., & Nicolosi, V. (2013). Impurity induced non-bulk stacking in chemically exfoliated h-BN nanosheets. Nanoscale, 5(6), 2290-4. https://doi.org/10.1039/c3nr33375b
Shmeliov, Aleksey, et al. "Impurity induced non-bulk stacking in chemically exfoliated h-BN nanosheets." Nanoscale vol. 5,6 (2013): 2290-4. doi: https://doi.org/10.1039/c3nr33375b
Shmeliov A, Kim JS, Borisenko KB, Wang P, Okunishi E, Shannon M, Kirkland AI, Nellist PD, Nicolosi V. Impurity induced non-bulk stacking in chemically exfoliated h-BN nanosheets. Nanoscale. 2013 Mar 21;5(6):2290-4. doi: 10.1039/c3nr33375b. PMID: 23420037.
Copy
Download .nbib