Cite
Gomella A, Martin EW, Lynch SK, et al. Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer. AIP Adv. 2013;3(4):42121doi: 10.1063/1.4802886.
Gomella, A., Martin, E. W., Lynch, S. K., Morgan, N. Y., & Wen, H. (2013). Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer. AIP advances, 3(4), 42121. https://doi.org/10.1063/1.4802886
Gomella, Andrew, et al. "Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer." AIP advances vol. 3,4 (2013): 42121. doi: https://doi.org/10.1063/1.4802886
Gomella A, Martin EW, Lynch SK, Morgan NY, Wen H. Low dose hard x-ray contact microscopy assisted by a photoelectric conversion layer. AIP Adv. 2013 Apr 18;3(4):42121. doi: 10.1063/1.4802886. Print 2013 Apr. PMID: 23837131; PMCID: PMC3645440.
Copy
Download .nbib