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Mun JH, Cha SK, Kim H, et al. Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning. Small. 2014;10(18):3742-9doi: 10.1002/smll.201400600.
Mun, J. H., Cha, S. K., Kim, H., Moon, H. S., Kim, J. Y., Jin, H. M., Choi, Y. J., Baek, J. E., Shin, J., Kim, S. O., Filbeck, G., Foster, B., & Preece, D. (2014). Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning. Small (Weinheim an der Bergstrasse, Germany), 10(18), 3742-9. https://doi.org/10.1002/smll.201400600
Mun, Jeong Ho, et al. "Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning." Small (Weinheim an der Bergstrasse, Germany) vol. 10,18 (2014): 3742-9. doi: https://doi.org/10.1002/smll.201400600
Mun JH, Cha SK, Kim H, Moon HS, Kim JY, Jin HM, Choi YJ, Baek JE, Shin J, Kim SO, Filbeck G, Foster B, Preece D. Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning. Small. 2014 Sep 24;10(18):3742-9. doi: 10.1002/smll.201400600. Epub 2014 May 13. PMID: 24821268.
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Small. 2014 Sep 24;10(18):3742-9. doi: 10.1002/smll.201400600. Epub 2014 May 13.

Nanodomain swelling block copolymer lithography for morphology tunable metal nanopatterning.

Small (Weinheim an der Bergstrasse, Germany)

Jeong Ho Mun, Seung Keun Cha, Hyowook Kim, Hyoung-Seok Moon, Ju Young Kim, Hyeong Min Jin, Young Joo Choi, Jeong Eun Baek, Jonghwa Shin, Sang Ouk Kim, Filbeck, Foster, Preece

Affiliations

  1. Center for Nanomaterials and Chemical Reactions, Institute for Basic Science (IBS), Daejeon, 305-701, Republic of Korea; Department of Materials Science and Engineering, KAIST, Daejeon, 305-701, Republic of Korea.

PMID: 24821268 DOI: 10.1002/smll.201400600

Abstract

Ordered metal nanopatterns are crucial requirements for electronics, magnetics, catalysts, photonics, and so on. Despite considerable progress in the synthetic route to metal nanostructures, highly ordered metal nanopatterning over a large-area is still challenging. Nanodomain swelling block copolymer lithography is presented as a general route to the systematic morphology tuning of metal nanopatterns from amphiphilic diblock copolymer self-assembly. Selective swelling of hydrophilic nanocylinder domains in amphiphilic block copolymer films during metal precursor loading and subsequent oxygen based etching generates diverse shapes of metal nanopatterns, including hexagonal nanoring array and hexagonal nanomesh and double line array in addition to common nanodot and nanowire arrays. Solvent annealing condition of block copolymer templates, selective swelling of hydrophilic cylinder nanodomains, block copolymer template thickness, and oxygen based etching methods are the decisive parameters for systematic morphology evolution. The plasmonic properties of ordered Au nanopatterns are characterized and analyzed with finite differential time domain calculation. This approach offers unprecedented opportunity for diverse metal nanopatterns from commonly used diblock copolymer self-assembly.

© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Keywords: block copolymers; metal; nanopatterns; plasmonics

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