Cite
Zhang J, Wang Z, Di X, et al. Effects of azimuthal angles on laser interference lithography. Appl Opt. 2014;53(27):6294-301doi: 10.1364/AO.53.006294.
Zhang, J., Wang, Z., Di, X., Zhao, L., & Wang, D. (2014). Effects of azimuthal angles on laser interference lithography. Applied optics, 53(27), 6294-301. https://doi.org/10.1364/AO.53.006294
Zhang, Jinjin, et al. "Effects of azimuthal angles on laser interference lithography." Applied optics vol. 53,27 (2014): 6294-301. doi: https://doi.org/10.1364/AO.53.006294
Zhang J, Wang Z, Di X, Zhao L, Wang D. Effects of azimuthal angles on laser interference lithography. Appl Opt. 2014 Sep 20;53(27):6294-301. doi: 10.1364/AO.53.006294. PMID: 25322110.
Copy
Download .nbib