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Ultramicroscopy. 2015 Apr;151:122-129. doi: 10.1016/j.ultramic.2014.11.009. Epub 2014 Nov 26.

Large-angle illumination STEM: toward three-dimensional atom-by-atom imaging.

Ultramicroscopy

Ryo Ishikawa, Andrew R Lupini, Yoyo Hinuma, Stephen J Pennycook

Affiliations

  1. Institute of Engineering Innovation, University of Tokyo, Tokyo 113-8656, Japan. Electronic address: [email protected].
  2. Materials Science & Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States.
  3. Department of Materials Science and Engineering, Kyoto University, Kyoto 606-8501, Japan.
  4. Department of Materials Science and Engineering, The University of Tennessee, 328 Ferris Hall, Knoxville, TN 37996, United States.

PMID: 25484363 DOI: 10.1016/j.ultramic.2014.11.009

Abstract

To fully understand and control materials and their properties, it is of critical importance to determine their atomic structures in all three dimensions. Recent revolutionary advances in electron optics - the inventions of geometric and chromatic aberration correctors as well as electron source monochromators - have provided fertile ground for performing optical depth sectioning at atomic-scale dimensions. In this study we theoretically demonstrate the imaging of top/sub-surface atomic structures and identify the depth of single dopants, single vacancies and the other point defects within materials by large-angle illumination scanning transmission electron microscopy (LAI-STEM). The proposed method also allows us to measure specimen properties such as thickness or three-dimensional surface morphology using observations from a single crystallographic orientation.

Copyright © 2014 Elsevier B.V. All rights reserved.

Keywords: Annular dark-field (ADF); Atomic-depth resolution imaging; Scanning transmission electron microscopy (STEM); Surface imaging

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