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Deng H, Endo K, Yamamura K. Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001). Sci Rep. 2015;5:8947doi: 10.1038/srep08947.
Deng, H., Endo, K., & Yamamura, K. (2015). Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001). Scientific reports, 58947. https://doi.org/10.1038/srep08947
Deng, Hui, et al. "Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001)." Scientific reports vol. 5 (2015): 8947. doi: https://doi.org/10.1038/srep08947
Deng H, Endo K, Yamamura K. Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001). Sci Rep. 2015 Mar 10;5:8947. doi: 10.1038/srep08947. PMID: 25752524; PMCID: PMC4353996.
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Sci Rep. 2015 Mar 10;5:8947. doi: 10.1038/srep08947.

Competition between surface modification and abrasive polishing: a method of controlling the surface atomic structure of 4H-SiC (0001).

Scientific reports

Hui Deng, Katsuyoshi Endo, Kazuya Yamamura

Affiliations

  1. Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan.

PMID: 25752524 PMCID: PMC4353996 DOI: 10.1038/srep08947

Abstract

The surface atomic step-terrace structure of 4H-SiC greatly affects its performance in power device applications. On the basis of the crystal structure of 4H-SiC, we propose the generation mechanism of the a-b-a*-b* type, a-b type and a-a type step-terrace structures. We demonstrate that the step-terrace structure of SiC can be controlled by adjusting the balance between chemical modification and physical removal in CeO2 slurry polishing. When chemical modification plays the main role in the polishing of SiC, the a-b-a*-b* type step-terrace structure can be generated. When the roles of physical removal and chemical modification have similar importance, the a-b-a*-b* type step-terrace structure changes to the a-b type. When physical removal is dominant, the uniform a-a type step-terrace structure can be generated.

References

  1. J Nanosci Nanotechnol. 2011 Apr;11(4):2928-30 - PubMed

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