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Sci Rep. 2015 Mar 10;5:8958. doi: 10.1038/srep08958.

Maskless milling of diamond by a focused oxygen ion beam.

Scientific reports

Aiden A Martin, Steven Randolph, Aurelien Botman, Milos Toth, Igor Aharonovich

Affiliations

  1. School of Physics and Advanced Materials, University of Technology, Sydney, 15 Broadway, Ultimo, New South Wales 2007, Australia.
  2. FEI Company, 5350 Northeast Dawson Creek Drive, Hillsboro, Oregon 97214-5793, USA.

PMID: 25753406 PMCID: PMC4354013 DOI: 10.1038/srep08958

Abstract

Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.

References

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