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Schindler P, Logar M, Provine J, et al. Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition. Langmuir. 2015;31(18):5057-62doi: 10.1021/acs.langmuir.5b00216.
Schindler, P., Logar, M., Provine, J., & Prinz, F. B. (2015). Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition. Langmuir : the ACS journal of surfaces and colloids, 31(18), 5057-62. https://doi.org/10.1021/acs.langmuir.5b00216
Schindler, Peter, et al. "Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition." Langmuir : the ACS journal of surfaces and colloids vol. 31,18 (2015): 5057-62. doi: https://doi.org/10.1021/acs.langmuir.5b00216
Schindler P, Logar M, Provine J, Prinz FB. Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition. Langmuir. 2015 May 12;31(18):5057-62. doi: 10.1021/acs.langmuir.5b00216. Epub 2015 Apr 30. PMID: 25896559.
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Langmuir. 2015 May 12;31(18):5057-62. doi: 10.1021/acs.langmuir.5b00216. Epub 2015 Apr 30.

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition.

Langmuir : the ACS journal of surfaces and colloids

Peter Schindler, Manca Logar, J Provine, Fritz B Prinz

Affiliations

  1. ?Laboratory for Materials Chemistry, National Institute of Chemistry Slovenia, Ljubljana 1000, Slovenia.

PMID: 25896559 DOI: 10.1021/acs.langmuir.5b00216

Abstract

Plasma-enhanced atomic layer deposition (PEALD) provides multiple benefits compared to thermal ALD including lower possible process temperature and a wider palette of possible materials. However, coverage of high aspect ratio (AR) structures is limited due to the recombination rates of the radical plasma species. We study the limits of conformality in 1:30 AR structures for TiO2 based on tetrakis(dimethylamido)titanium (TDMA-Ti) and O2 plasma through variation in plasma exposure and substrate temperature. Extending plasma exposure duration and decreasing substrate temperature within the ALD window both serve to improve the conformality of the deposited film, with coverage >95% achievable. Additionally, the changes in morphology of the TiO2 were examined with crystallites of anatase and brookite found.

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