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Beilstein J Nanotechnol. 2015 Apr 30;6:1091-9. doi: 10.3762/bjnano.6.110. eCollection 2015.

High sensitivity and high resolution element 3D analysis by a combined SIMS-SPM instrument.

Beilstein journal of nanotechnology

Yves Fleming, Tom Wirtz

Affiliations

  1. Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg.

PMID: 26171285 PMCID: PMC4464366 DOI: 10.3762/bjnano.6.110

Abstract

Using the recently developed SIMS-SPM prototype, secondary ion mass spectrometry (SIMS) data was combined with topographical data from the scanning probe microscopy (SPM) module for five test structures in order to obtain accurate chemical 3D maps: a polystyrene/polyvinylpyrrolidone (PS/PVP) polymer blend, a nickel-based super-alloy, a titanium carbonitride-based cermet, a reticle test structure and Mg(OH)2 nanoclusters incorporated inside a polymer matrix. The examples illustrate the potential of this combined approach to track and eliminate artefacts related to inhomogeneities of the sputter rates (caused by samples containing various materials, different phases or having a non-flat surface) and inhomogeneities of the secondary ion extraction efficiencies due to local field distortions (caused by topography with high aspect ratios). In this respect, this paper presents the measured relative sputter rates between PVP and PS as well as in between the different phases of the TiCN cermet.

Keywords: SIMS artefacts; alloy; atomic force microscopy (AFM); correlative microscopy; differential sputtering; in situ; multimodal imaging; nano-cluster; polymer blend; scanning probe microscopy (SPM); secondary ion mass spectrometry (SIMS); sputter rate; sputter-induced effects

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