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Nano Lett. 2015 Aug 12;15(8):5098-104. doi: 10.1021/acs.nanolett.5b01246. Epub 2015 Jul 20.

Strain Relaxation in CVD Graphene: Wrinkling with Shear Lag.

Nano letters

Merijntje S Bronsgeest, Nedjma Bendiab, Shashank Mathur, Amina Kimouche, Harley T Johnson, Johann Coraux, Pascal Pochet

Affiliations

  1. †Université Grenoble Alpes, F-38000, Grenoble, France.
  2. ‡CEA, INAC-SP2M, F-38054, Grenoble, France.
  3. §CNRS, Inst NEEL, F-38042, Grenoble, France.
  4. ?Department of Mechanical Science and Engineering, University of Illinois at Urbana-Champaign, Champaign, Illinois 61801, United States.

PMID: 26171667 DOI: 10.1021/acs.nanolett.5b01246

Abstract

We measure uniaxial strain fields in the vicinity of edges and wrinkles in graphene prepared by chemical vapor deposition (CVD), by combining microscopy techniques and local vibrational characterization. These strain fields have magnitudes of several tenths of a percent and extend across micrometer distances. The nonlinear shear-lag model remarkably captures these strain fields in terms of the graphene-substrate interaction and provides a complete understanding of strain-relieving wrinkles in graphene for any level of graphene-substrate coherency.

Keywords: Raman spectroscopy; buckling; graphene on cobalt; shear lag; strain relief; uniaxial strain

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