Display options
Cite
Fox DS, Zhou Y, Maguire P, et al. Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam. Nano Lett. 2015;15(8):5307-13doi: 10.1021/acs.nanolett.5b01673.
Fox, D. S., Zhou, Y., Maguire, P., O'Neill, A., Ó'Coileáin, C., Gatensby, R., Glushenkov, A. M., Tao, T., Duesberg, G. S., Shvets, I. V., Abid, M., Abid, M., Wu, H. C., Chen, Y., Coleman, J. N., Donegan, J. F., & Zhang, H. (2015). Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam. Nano letters, 15(8), 5307-13. https://doi.org/10.1021/acs.nanolett.5b01673
Fox, Daniel S, et al. "Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam." Nano letters vol. 15,8 (2015): 5307-13. doi: https://doi.org/10.1021/acs.nanolett.5b01673
Fox DS, Zhou Y, Maguire P, O'Neill A, Ó'Coileáin C, Gatensby R, Glushenkov AM, Tao T, Duesberg GS, Shvets IV, Abid M, Abid M, Wu HC, Chen Y, Coleman JN, Donegan JF, Zhang H. Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam. Nano Lett. 2015 Aug 12;15(8):5307-13. doi: 10.1021/acs.nanolett.5b01673. Epub 2015 Jul 15. PMID: 26154305.
Copy Download .nbib Format: NLM
Share it on

Nano Lett. 2015 Aug 12;15(8):5307-13. doi: 10.1021/acs.nanolett.5b01673. Epub 2015 Jul 15.

Nanopatterning and Electrical Tuning of MoS2 Layers with a Subnanometer Helium Ion Beam.

Nano letters

Daniel S Fox, Yangbo Zhou, Pierce Maguire, Arlene O'Neill, Cormac Ó'Coileáin, Riley Gatensby, Alexey M Glushenkov, Tao Tao, Georg S Duesberg, Igor V Shvets, Mohamed Abid, Mourad Abid, Han-Chun Wu, Ying Chen, Jonathan N Coleman, John F Donegan, Hongzhou Zhang

Affiliations

  1. §Institute for Frontier Materials, Deakin University, Waurn Ponds, VIC 3216, Australia.
  2. ?Melbourne Centre for Nanofabrication, 151 Wellington Rd, Clayton, VIC 3168, Australia.
  3. ?KSU-Aramco Center, King Saud University, Riyadh 11451, Saudi Arabia.
  4. #School of Physics, Beijing Institute of Technology, Beijing, 100081, People's Republic of China.

PMID: 26154305 DOI: 10.1021/acs.nanolett.5b01673

Abstract

We report subnanometer modification enabled by an ultrafine helium ion beam. By adjusting ion dose and the beam profile, structural defects were controllably introduced in a few-layer molybdenum disulfide (MoS2) sample and its stoichiometry was modified by preferential sputtering of sulfur at a few-nanometer scale. Localized tuning of the resistivity of MoS2 was demonstrated and semiconducting, metallic-like, or insulating material was obtained by irradiation with different doses of He(+). Amorphous MoSx with metallic behavior has been demonstrated for the first time. Fabrication of MoS2 nanostructures with 7 nm dimensions and pristine crystal structure was also achieved. The damage at the edges of these nanostructures was typically confined to within 1 nm. Nanoribbons with widths as small as 1 nm were reproducibly fabricated. This nanoscale modification technique is a generalized approach that can be applied to various two-dimensional (2D) materials to produce a new range of 2D metamaterials.

Keywords: Helium ion beam; MoS2; electrical tuning; nanopatterning; nanoribbon; stoichiometry

Publication Types