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Appl Opt. 2015 Jun 10;54(17):5508-12. doi: 10.1364/AO.54.005508.

Photosensitivity of gallium-doped silica core fiber to 193 nm ArF excimer laser.

Applied optics

Dinusha S Gunawardena, Khairul A Mat-Sharif, Nizam Tamchek, Man-Hong Lai, Nasr Y M Omar, Siamak D Emami, Shahrin Z Muhamad-Yasin, Mohd I Zulkifli, Zulfadzli Yusoff, Hairul A Abdul-Rashid, Kok-Sing Lim, Harith Ahmad

PMID: 26192853 DOI: 10.1364/AO.54.005508

Abstract

Grating inscription in a Ga-doped silica core fiber (~5 wt. % Ga) has been demonstrated using ArF (193 nm) and KrF (248 nm) excimer lasers. In a comparative study with germanosilicate fiber with similar Ge concentration, a Ga-doped silica core fiber shows greater photosensitivity to an ArF excimer laser due to the higher absorbance in the region of 190-195 nm. In addition, the photosensitivity of a Ga-doped silica core fiber has been greatly enhanced with hydrogenation. Ga-doped fibers are potential photosensitive fibers for fiber Bragg grating production with an ArF excimer laser.

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