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Jin D, Hu Q, Neuhauser D, et al. Quantum-Spillover-Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics. Phys Rev Lett. 2015;115(19):193901doi: 10.1103/PhysRevLett.115.193901.
Jin, D., Hu, Q., Neuhauser, D., von Cube, F., Yang, Y., Sachan, R., Luk, T. S., Bell, D. C., & Fang, N. X. (2015). Quantum-Spillover-Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics. Physical review letters, 115(19), 193901. https://doi.org/10.1103/PhysRevLett.115.193901
Jin, Dafei, et al. "Quantum-Spillover-Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics." Physical review letters vol. 115,19 (2015): 193901. doi: https://doi.org/10.1103/PhysRevLett.115.193901
Jin D, Hu Q, Neuhauser D, von Cube F, Yang Y, Sachan R, Luk TS, Bell DC, Fang NX. Quantum-Spillover-Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics. Phys Rev Lett. 2015 Nov 06;115(19):193901. doi: 10.1103/PhysRevLett.115.193901. Epub 2015 Nov 03. PMID: 26588382.
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Phys Rev Lett. 2015 Nov 06;115(19):193901. doi: 10.1103/PhysRevLett.115.193901. Epub 2015 Nov 03.

Quantum-Spillover-Enhanced Surface-Plasmonic Absorption at the Interface of Silver and High-Index Dielectrics.

Physical review letters

Dafei Jin, Qing Hu, Daniel Neuhauser, Felix von Cube, Yingyi Yang, Ritesh Sachan, Ting S Luk, David C Bell, Nicholas X Fang

Affiliations

  1. Department of Mechanical Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA.
  2. Department of Chemistry and Biochemistry, University of California at Los Angeles, Los Angeles, California 90095, USA.
  3. School of Engineering and Applied Sciences, Harvard University, Cambridge, Massachusetts 02138, USA.
  4. Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, USA.
  5. Sandia National Laboratory, Albuquerque, New Mexico 87123, USA.

PMID: 26588382 DOI: 10.1103/PhysRevLett.115.193901

Abstract

We demonstrate an unexpectedly strong surface-plasmonic absorption at the interface of silver and high-index dielectrics based on electron and photon spectroscopy. The measured bandwidth and intensity of absorption deviate significantly from the classical theory. Our density-functional calculation well predicts the occurrence of this phenomenon. It reveals that due to the low metal-to-dielectric work function at such interfaces, conduction electrons can display a drastic quantum spillover, causing the interfacial electron-hole pair production to dominate the decay of surface plasmons. This finding can be of fundamental importance in understanding and designing quantum nanoplasmonic devices that utilize noble metals and high-index dielectrics.

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