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J Am Chem Soc. 2016 Mar 09;138(9):2961-4. doi: 10.1021/jacs.6b00436. Epub 2016 Feb 25.

Designing a Beryllium-Free Deep-Ultraviolet Nonlinear Optical Material without a Structural Instability Problem.

Journal of the American Chemical Society

Sangen Zhao, Lei Kang, Yaoguo Shen, Xiaodong Wang, Muhammad Adnan Asghar, Zheshuai Lin, Yingying Xu, Siyuan Zeng, Maochun Hong, Junhua Luo

Affiliations

  1. State Key Laboratory of Structural Chemistry, and Key Laboratory of Optoelectronic Materials Chemistry and Physics, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences , Fuzhou, Fujian 350002, China.
  2. Beijing Center for Crystal R&D, Key Lab of Functional Crystals and Laser Technology of Chinese Academy of Sciences, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences , Beijing 100190, China.
  3. University of Chinese Academy of Sciences , Beijing 100049, China.
  4. Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences , Changchun 130033, China.

PMID: 26889570 DOI: 10.1021/jacs.6b00436

Abstract

A beryllium-free deep-ultraviolet (deep-UV) nonlinear optical (NLO) material K3Ba3Li2Al4B6O20F is developed mainly by the element substitution of Be for Al and Li from Sr2Be2B2O7 that was considered as one of the most promising deep-UV NLO materials. K3Ba3Li2Al4B6O20F preserves the structural merits of Sr2Be2B2O7 and thus exhibits no layering growth tendency and possesses the optical properties required for deep-UV NLO applications, including deep-UV transparency, phase-matchability, and sufficiently large second-harmonic generation (1.5 × KH2PO4). Furthermore, it overcomes the structural instability problem of Sr2Be2B2O7, which is confirmed by the obtainment of large single crystals and phonon dispersion calculations. These attributes make it very attractive for next-generation deep-UV NLO materials. The substitution of Be for Al and Li in beryllium borates provides a new opportunity to design beryllium-free deep-UV NLO materials with good performance.

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