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Wang P, Chen Q, Wu X, et al. Detailed Study of the Influence of InGaAs Matrix on the Strain Reduction in the InAs Dot-In-Well Structure. Nanoscale Res Lett. 2016;11(1):119doi: 10.1186/s11671-016-1339-3.
Wang, P., Chen, Q., Wu, X., Cao, C., Wang, S., & Gong, Q. (2016). Detailed Study of the Influence of InGaAs Matrix on the Strain Reduction in the InAs Dot-In-Well Structure. Nanoscale research letters, 11(1), 119. https://doi.org/10.1186/s11671-016-1339-3
Wang, Peng, et al. "Detailed Study of the Influence of InGaAs Matrix on the Strain Reduction in the InAs Dot-In-Well Structure." Nanoscale research letters vol. 11,1 (2016): 119. doi: https://doi.org/10.1186/s11671-016-1339-3
Wang P, Chen Q, Wu X, Cao C, Wang S, Gong Q. Detailed Study of the Influence of InGaAs Matrix on the Strain Reduction in the InAs Dot-In-Well Structure. Nanoscale Res Lett. 2016 Dec;11(1):119. doi: 10.1186/s11671-016-1339-3. Epub 2016 Mar 01. PMID: 26932758; PMCID: PMC4773316.
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Nanoscale Res Lett. 2016 Dec;11(1):119. doi: 10.1186/s11671-016-1339-3. Epub 2016 Mar 01.

Detailed Study of the Influence of InGaAs Matrix on the Strain Reduction in the InAs Dot-In-Well Structure.

Nanoscale research letters

Peng Wang, Qimiao Chen, Xiaoyan Wu, Chunfang Cao, Shumin Wang, Qian Gong

Affiliations

  1. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].
  2. School of Physics, University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China. [email protected].
  3. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].
  4. School of Physics, University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China. [email protected].
  5. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].
  6. School of Physics, University of Chinese Academy of Sciences, 19 Yuquan Road, Beijing, 100049, China. [email protected].
  7. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].
  8. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].
  9. Department of Microtechnology and Nanoscience, Chalmers University of Technology, 41296, Gothenburg, Sweden. [email protected].
  10. State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai, 200050, China. [email protected].

PMID: 26932758 PMCID: PMC4773316 DOI: 10.1186/s11671-016-1339-3

Abstract

InAs/InGaAs dot-in-well (DWELL) structures have been investigated with the systematically varied InGaAs thickness. Both the strained buffer layer (SBL) below the dot layer and the strain-reducing layer (SRL) above the dot layer were found to be responsible for the redshift in photoluminescence (PL) emission of the InAs/InGaAs DWELL structure. A linear followed by a saturation behavior of the emission redshift was observed as a function of the SBL and SRL thickness, respectively. The PL intensity is greatly enhanced by applying both of the SRL and SBL. Finite element analysis simulation and transmission electron microscopy (TEM) measurement were carried out to analyze the strain distribution in the InAs QD and the InGaAs SBL. The results clearly indicate the strain reduction in the QD induced by the SBL, which are likely the main cause for the emission redshift.

Keywords: AFM; Dot-in-well; Finite element; InAs/InGaAs; InGaAs matrix; Photoluminescence; Quantum dots; TEM

References

  1. Opt Express. 2014 May 19;22(10):11528-35 - PubMed

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