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Samant SP, Grabowski CA, Kisslinger K, et al. Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors. ACS Appl Mater Interfaces. 2016;8(12):7966-76doi: 10.1021/acsami.5b11851.
Samant, S. P., Grabowski, C. A., Kisslinger, K., Yager, K. G., Yuan, G., Satija, S. K., Durstock, M. F., Raghavan, D., & Karim, A. (2016). Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors. ACS applied materials & interfaces, 8(12), 7966-76. https://doi.org/10.1021/acsami.5b11851
Samant, Saumil P, et al. "Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors." ACS applied materials & interfaces vol. 8,12 (2016): 7966-76. doi: https://doi.org/10.1021/acsami.5b11851
Samant SP, Grabowski CA, Kisslinger K, Yager KG, Yuan G, Satija SK, Durstock MF, Raghavan D, Karim A. Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors. ACS Appl Mater Interfaces. 2016 Mar;8(12):7966-76. doi: 10.1021/acsami.5b11851. Epub 2016 Mar 18. PMID: 26942835.
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ACS Appl Mater Interfaces. 2016 Mar;8(12):7966-76. doi: 10.1021/acsami.5b11851. Epub 2016 Mar 18.

Directed Self-Assembly of Block Copolymers for High Breakdown Strength Polymer Film Capacitors.

ACS applied materials & interfaces

Saumil P Samant, Christopher A Grabowski, Kim Kisslinger, Kevin G Yager, Guangcui Yuan, Sushil K Satija, Michael F Durstock, Dharmaraj Raghavan, Alamgir Karim

Affiliations

  1. Department of Polymer Engineering, University of Akron , Akron, Ohio 44325, United States.
  2. Air Force Research Laboratory, Wright Patterson Air Force Base , Dayton, Ohio 45433, United States.
  3. Center for Functional Nanomaterials, Brookhaven National Laboratory , Upton, New York 11973, United States.
  4. Center for Neutron Research, National Institute of Standards and Technology (NIST) , Gaithersburg, Maryland 20899, United States.
  5. Department of Chemistry, Howard University , Washington, D.C. 20059, United States.

PMID: 26942835 DOI: 10.1021/acsami.5b11851

Abstract

Emerging needs for fast charge/discharge yet high-power, lightweight, and flexible electronics requires the use of polymer-film-based solid-state capacitors with high energy densities. Fast charge/discharge rates of film capacitors on the order of microseconds are not achievable with slower charging conventional batteries, supercapacitors and related hybrid technologies. However, the current energy densities of polymer film capacitors fall short of rising demand, and could be significantly enhanced by increasing the breakdown strength (EBD) and dielectric permittivity (εr) of the polymer films. Co-extruded two-homopolymer component multilayered films have demonstrated much promise in this regard showing higher EBD over that of component polymers. Multilayered films can also help incorporate functional features besides energy storage, such as enhanced optical, mechanical, thermal and barrier properties. In this work, we report accomplishing multilayer, multicomponent block copolymer dielectric films (BCDF) with soft-shear driven highly oriented self-assembled lamellar diblock copolymers (BCP) as a novel application of this important class of self-assembling materials. Results of a model PS-b-PMMA system show ∼50% enhancement in EBD of self-assembled multilayer lamellar BCP films compared to unordered as-cast films, indicating that the breakdown is highly sensitive to the nanostructure of the BCP. The enhancement in EBD is attributed to the "barrier effect", where the multiple interfaces between the lamellae block components act as barriers to the dielectric breakdown through the film. The increase in EBD corresponds to more than doubling the energy storage capacity using a straightforward directed self-assembly strategy. This approach opens a new nanomaterial paradigm for designing high energy density dielectric materials.

Keywords: barrier effect; block copolymer; breakdown strength; capacitor; cold zone annealing−soft shear; dielectric; directed self-assembly; lamellae

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