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Sharma S, Gahan D, Scullin P, et al. Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance. Rev Sci Instrum. 2016;87(4):043511doi: 10.1063/1.4946788.
Sharma, S., Gahan, D., Scullin, P., Doyle, J., Lennon, J., Vijayaraghavan, R. K., Daniels, S., & Hopkins, M. B. (2016). Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance. The Review of scientific instruments, 87(4), 043511. https://doi.org/10.1063/1.4946788
Sharma, Shailesh, et al. "Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance." The Review of scientific instruments vol. 87,4 (2016): 043511. doi: https://doi.org/10.1063/1.4946788
Sharma S, Gahan D, Scullin P, Doyle J, Lennon J, Vijayaraghavan RK, Daniels S, Hopkins MB. Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance. Rev Sci Instrum. 2016 Apr;87(4):043511. doi: 10.1063/1.4946788. PMID: 27131678.
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Rev Sci Instrum. 2016 Apr;87(4):043511. doi: 10.1063/1.4946788.

Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.

The Review of scientific instruments

Shailesh Sharma, David Gahan, Paul Scullin, James Doyle, Jj Lennon, Rajani K Vijayaraghavan, Stephen Daniels, M B Hopkins

Affiliations

  1. Dublin City University, Glasnevin, Dublin 9, Ireland.
  2. Impedans Limited, Chase House, City Junction Business Park, Northern Cross, D17 AK63, Dublin 17, Ireland.

PMID: 27131678 DOI: 10.1063/1.4946788

Abstract

A compact retarding field analyzer with embedded quartz crystal microbalance has been developed to measure deposition rate, ionized flux fraction, and ion energy distribution arriving at the substrate location. The sensor can be placed on grounded, electrically floating, or radio frequency (rf) biased electrodes. A calibration method is presented to compensate for temperature effects in the quartz crystal. The metal deposition rate, metal ionization fraction, and energy distribution of the ions arriving at the substrate location are investigated in an asymmetric bipolar pulsed dc magnetron sputtering reactor under grounded, floating, and rf biased conditions. The diagnostic presented in this research work does not suffer from complications caused by water cooling arrangements to maintain constant temperature and is an attractive technique for characterizing a thin film deposition system.

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