Langmuir. 2017 May 02;33(17):4207-4215. doi: 10.1021/acs.langmuir.7b00614. Epub 2017 Apr 19.

Base Layer Influence on Protonated Aminosilane Gradient Wettability.

Langmuir : the ACS journal of surfaces and colloids

Kayesh M Ashraf, Chenyu Wang, Sithara S Nair, Kenneth J Wynne, Daniel A Higgins, Maryanne M Collinson

PMID: 28421767 DOI: 10.1021/acs.langmuir.7b00614

Abstract

Protonated amine gradients have been prepared on silicon wafers via programmed controlled rate infusion (CRI) with varying degrees of hydrophobicity and characterized by X-ray photoelectron spectroscopy (XPS) and static and Wilhelmy plate dynamic contact angle measurements. Initially, base layers were spin coated from sols containing tetramethoxysilane (TMOS) and either phenyltrimethoxysilane (PTMOS), dimethyldimethoxysilane (DMDMOS), or octyltrimethoxysilane (OTMOS, C8). Amine gradients were then prepared from 3-aminopropyltriethoxysilane (APTEOS) via CRI. Gradients were exposed to concentrated HCl vapor for amine protonation. XPS showed that NH

Publication Types

• Journal Article
• Research Support, U.S. Gov't, Non-P.H.S.
• Research Support, Non-U.S. Gov't