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Microsc Microanal. 2017 Aug;23(4):782-793. doi: 10.1017/S1431927617000514. Epub 2017 Jun 19.

A Small Spot, Inert Gas, Ion Milling Process as a Complementary Technique to Focused Ion Beam Specimen Preparation.

Microscopy and microanalysis : the official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada

Paul E Fischione, Robert E A Williams, Arda Genç, Hamish L Fraser, Rafal E Dunin-Borkowski, Martina Luysberg, Cecile S Bonifacio, András Kovács

Affiliations

  1. 1E.A. Fischione Instruments Inc.,9003 Corporate Circle,Export,PA 15632,USA.
  2. 2Center for the Accelerated Maturation of Materials,The Ohio State University,1305 Kinnear Road,Columbus,OH 43212,USA.
  3. 3Ernst Ruska-Centre for Microscopy and Spectroscopy with Electrons and Peter Grünberg Institute,Forschungszentrum Jülich GmbH,Wilhelm-Johnen-Straße,52425 Jülich,Germany.

PMID: 28625222 DOI: 10.1017/S1431927617000514

Abstract

This paper reports on the substantial improvement of specimen quality by use of a low voltage (0.05 to ~1 keV), small diameter (~1 μm), argon ion beam following initial preparation using conventional broad-beam ion milling or focused ion beam. The specimens show significant reductions in the amorphous layer thickness and implanted artifacts. The targeted ion milling controls the specimen thickness according to the needs of advanced aberration-corrected and/or analytical transmission electron microscopy applications.

Keywords: amorphous damage; artifact; focused ion beam; implantation; ion milling

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