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Isohashi A, Bui PV, Toh D, et al. Chemical etching of silicon carbide in pure water by using platinum catalyst. Appl Phys Lett. 2017;110(20):201601doi: 10.1063/1.4983206.
Isohashi, A., Bui, P. V., Toh, D., Matsuyama, S., Sano, Y., Inagaki, K., Morikawa, Y., & Yamauchi, K. (2017). Chemical etching of silicon carbide in pure water by using platinum catalyst. Applied physics letters, 110(20), 201601. https://doi.org/10.1063/1.4983206
Isohashi, Ai, et al. "Chemical etching of silicon carbide in pure water by using platinum catalyst." Applied physics letters vol. 110,20 (2017): 201601. doi: https://doi.org/10.1063/1.4983206
Isohashi A, Bui PV, Toh D, Matsuyama S, Sano Y, Inagaki K, Morikawa Y, Yamauchi K. Chemical etching of silicon carbide in pure water by using platinum catalyst. Appl Phys Lett. 2017 May 15;110(20):201601. doi: 10.1063/1.4983206. PMID: 28611484; PMCID: PMC5432371.
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