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Rev Sci Instrum. 2017 Sep;88(9):096106. doi: 10.1063/1.4995080.

Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition.

The Review of scientific instruments

S Flege, R Hatada, A Derepa, C Dietz, W Ensinger, K Baba

Affiliations

  1. Department of Materials Science, Technische Universität Darmstadt, 64287 Darmstadt, Germany.
  2. Graduate School of Engineering, Nagasaki University, Nagasaki 852-8521, Japan.

PMID: 28964196 DOI: 10.1063/1.4995080

Abstract

A sample holder with a large open area offers several benefits when used in the process of plasma immersion ion implantation and deposition in which the plasma is generated by a high voltage applied to the sample holder: The ignition voltage of the plasma is lower, and the deposition rate can be several times higher than in the case of a normal plate-like holder. There is a more pronounced edge effect regarding the film thickness. Other film properties are also affected; for diamond-like carbon films, the film structure exhibits more disorder. The hardness of the samples is similar, with the surfaces of the samples being very smooth.

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