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Flege S, Hatada R, Derepa A, et al. Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition. Rev Sci Instrum. 2017;88(9):096106doi: 10.1063/1.4995080.
Flege, S., Hatada, R., Derepa, A., Dietz, C., Ensinger, W., & Baba, K. (2017). Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition. The Review of scientific instruments, 88(9), 096106. https://doi.org/10.1063/1.4995080
Flege, S, et al. "Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition." The Review of scientific instruments vol. 88,9 (2017): 096106. doi: https://doi.org/10.1063/1.4995080
Flege S, Hatada R, Derepa A, Dietz C, Ensinger W, Baba K. Note: Sample holder with open area for increased deposition rate in plasma immersion ion implantation and deposition. Rev Sci Instrum. 2017 Sep;88(9):096106. doi: 10.1063/1.4995080. PMID: 28964196.
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