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de Santiago F, Trejo A, Miranda A, et al. Band-gap engineering of halogenated silicon nanowires through molecular doping. J Mol Model. 2017;23(11):314doi: 10.1007/s00894-017-3484-8.
de Santiago, F., Trejo, A., Miranda, A., Carvajal, E., Pérez, L. A., & Cruz-Irisson, M. (2017). Band-gap engineering of halogenated silicon nanowires through molecular doping. Journal of molecular modeling, 23(11), 314. https://doi.org/10.1007/s00894-017-3484-8
de Santiago, Francisco, et al. "Band-gap engineering of halogenated silicon nanowires through molecular doping." Journal of molecular modeling vol. 23,11 (2017): 314. doi: https://doi.org/10.1007/s00894-017-3484-8
de Santiago F, Trejo A, Miranda A, Carvajal E, Pérez LA, Cruz-Irisson M. Band-gap engineering of halogenated silicon nanowires through molecular doping. J Mol Model. 2017 Oct 16;23(11):314. doi: 10.1007/s00894-017-3484-8. PMID: 29035419.
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