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Miller PA, Hebner GA, Greenberg KE, et al. An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell. J Res Natl Inst Stand Technol. 1995;100(4):427-439doi: 10.6028/jres.100.032.
Miller, P. A., Hebner, G. A., Greenberg, K. E., Pochan, P. D., & Aragon, B. P. (1995). An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell. Journal of research of the National Institute of Standards and Technology, 100(4), 427-439. https://doi.org/10.6028/jres.100.032
Miller, Paul A, et al. "An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell." Journal of research of the National Institute of Standards and Technology vol. 100,4 (1995): 427-439. doi: https://doi.org/10.6028/jres.100.032
Miller PA, Hebner GA, Greenberg KE, Pochan PD, Aragon BP. An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell. J Res Natl Inst Stand Technol. 1995 Jul-Aug;100(4):427-439. doi: 10.6028/jres.100.032. PMID: 29151752; PMCID: PMC4887237.
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J Res Natl Inst Stand Technol. 1995 Jul-Aug;100(4):427-439. doi: 10.6028/jres.100.032.

An Inductively Coupled Plasma Source for the Gaseous Electronics Conference RF Reference Cell.

Journal of research of the National Institute of Standards and Technology

Paul A Miller, Gregory A Hebner, Kenneth E Greenberg, Paul D Pochan, Ben P Aragon

Affiliations

  1. Sandia National Laboratories, Albuquerque, NM 87185-1423.
  2. Department of Chemical and Nuclear Engineering, University of New Mexico, Albuquerque, NM 87131.
  3. Applied Physics, Inc., Albuquerque, NM 87110.

PMID: 29151752 PMCID: PMC4887237 DOI: 10.6028/jres.100.032

Abstract

In order to extend the operating range of the GEC RF Reference Cell, we developed an inductively coupled plasma source that replaced the standard parallel-plate upper-electrode assembly. Voltage and current probes, Langmuir probes, and an 80 GHz interferometer provided information on plasmas formed in argon, chlorine, and nitrogen at pressures from 0.1 Pa to 3 Pa. For powers deposited in the plasma from 20 W to 300 W, the source produced peak electron densities between 10

Keywords: GEC RF Reference Cell; Langmuir probes; high density plasmas; inductively coupled plasmas

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