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Zdora MC, Zanette I, Zhou T, et al. At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis. Opt Express. 2018;26(4):4989-5004doi: 10.1364/OE.26.004989.
Zdora, M. C., Zanette, I., Zhou, T., Koch, F. J., Romell, J., Sala, S., Last, A., Ohishi, Y., Hirao, N., Rau, C., & Thibault, P. (2018). At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis. Optics express, 26(4), 4989-5004. https://doi.org/10.1364/OE.26.004989
Zdora, Marie-Christine, et al. "At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis." Optics express vol. 26,4 (2018): 4989-5004. doi: https://doi.org/10.1364/OE.26.004989
Zdora MC, Zanette I, Zhou T, Koch FJ, Romell J, Sala S, Last A, Ohishi Y, Hirao N, Rau C, Thibault P. At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis. Opt Express. 2018 Feb 19;26(4):4989-5004. doi: 10.1364/OE.26.004989. PMID: 29475342.
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Opt Express. 2018 Feb 19;26(4):4989-5004. doi: 10.1364/OE.26.004989.

At-wavelength optics characterisation via X-ray speckle- and grating-based unified modulated pattern analysis.

Optics express

Marie-Christine Zdora, Irene Zanette, Tunhe Zhou, Frieder J Koch, Jenny Romell, Simone Sala, Arndt Last, Yasuo Ohishi, Naohisa Hirao, Christoph Rau, Pierre Thibault

PMID: 29475342 DOI: 10.1364/OE.26.004989

Abstract

The current advances in new generation X-ray sources are calling for the development and improvement of high-performance optics. Techniques for high-sensitivity phase sensing and wavefront characterisation, preferably performed at-wavelength, are increasingly required for quality control, optimisation and development of such devices. We here show that the recently proposed unified modulated pattern analysis (UMPA) can be used for these purposes. We characterised two polymer X-ray refractive lenses and quantified the effect of beam damage and shape errors on their refractive properties. Measurements were performed with two different setups for UMPA and validated with conventional X-ray grating interferometry. Due to its adaptability to different setups, the ease of implementation and cost-effectiveness, we expect UMPA to find applications for high-throughput quantitative optics characterisation and wavefront sensing.

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