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Ellsworth AA, Walker AV. Effect of Ethanolamines on the Electroless Deposition of Copper on Functionalized Organic Surfaces. Langmuir. 2018;34(14):4142-4149doi: 10.1021/acs.langmuir.7b03725.
Ellsworth, A. A., & Walker, A. V. (2018). Effect of Ethanolamines on the Electroless Deposition of Copper on Functionalized Organic Surfaces. Langmuir : the ACS journal of surfaces and colloids, 34(14), 4142-4149. https://doi.org/10.1021/acs.langmuir.7b03725
Ellsworth, Ashley A, and Walker, Amy V. "Effect of Ethanolamines on the Electroless Deposition of Copper on Functionalized Organic Surfaces." Langmuir : the ACS journal of surfaces and colloids vol. 34,14 (2018): 4142-4149. doi: https://doi.org/10.1021/acs.langmuir.7b03725
Ellsworth AA, Walker AV. Effect of Ethanolamines on the Electroless Deposition of Copper on Functionalized Organic Surfaces. Langmuir. 2018 Apr 10;34(14):4142-4149. doi: 10.1021/acs.langmuir.7b03725. Epub 2018 Mar 27. PMID: 29526106.
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Langmuir. 2018 Apr 10;34(14):4142-4149. doi: 10.1021/acs.langmuir.7b03725. Epub 2018 Mar 27.

Effect of Ethanolamines on the Electroless Deposition of Copper on Functionalized Organic Surfaces.

Langmuir : the ACS journal of surfaces and colloids

Ashley A Ellsworth, Amy V Walker

PMID: 29526106 DOI: 10.1021/acs.langmuir.7b03725

Abstract

Electroless deposition (ELD) is widely used in industry to deposit metals because it is inexpensive and compatible with organic materials. The deposition rate and deposited film properties critically depend on the reducing agent, complexing agent, and bath pH and temperature as well as bath additives. We have investigated the role of ethanolamine additives in the ELD of copper using the reducing agent dimethylamine borane on -CH

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