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Kang S, Mauchauffé R, You YS, et al. Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films. Sci Rep. 2018;8(1):16684doi: 10.1038/s41598-018-35154-4.
Kang, S., Mauchauffé, R., You, Y. S., & Moon, S. Y. (2018). Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films. Scientific reports, 8(1), 16684. https://doi.org/10.1038/s41598-018-35154-4
Kang, Seongchan, et al. "Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films." Scientific reports vol. 8,1 (2018): 16684. doi: https://doi.org/10.1038/s41598-018-35154-4
Kang S, Mauchauffé R, You YS, Moon SY. Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films. Sci Rep. 2018 Nov 12;8(1):16684. doi: 10.1038/s41598-018-35154-4. PMID: 30420716; PMCID: PMC6232178.
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Sci Rep. 2018 Nov 12;8(1):16684. doi: 10.1038/s41598-018-35154-4.

Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films.

Scientific reports

Seongchan Kang, Rodolphe Mauchauffé, Yong Sung You, Se Youn Moon

Affiliations

  1. Department of Applied Plasma Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, 54896, Republic of Korea.
  2. Department of Quantum System Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, 54896, Republic of Korea.
  3. Department of Applied Plasma Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, 54896, Republic of Korea. [email protected].
  4. Department of Quantum System Engineering, Chonbuk National University, 567 Baekje-daero, Deokjin-gu, Jeonju-si, Jeollabuk-do, 54896, Republic of Korea. [email protected].

PMID: 30420716 PMCID: PMC6232178 DOI: 10.1038/s41598-018-35154-4

Abstract

In this work, the effect of plasma on the chemistry and morphology of coatings deposited by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition (AP-PECVD) is investigated. To do so, plasma deposited amorphous titanium dioxide (TiO

References

  1. ACS Appl Mater Interfaces. 2016 Sep 28;8(38):25024-9 - PubMed
  2. ACS Appl Mater Interfaces. 2017 Apr 19;9(15):13733-13741 - PubMed
  3. ACS Appl Mater Interfaces. 2010 Dec;2(12):3397-400 - PubMed
  4. Appl Opt. 1976 Dec 1;15(12):2986-91 - PubMed
  5. ACS Appl Mater Interfaces. 2016 Jul 20;8(28):17999-8007 - PubMed

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