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Gorbunov SA, Rymzhanov RA, Volkov AE. Dependence of track etching kinetics on chemical reactivity around the ion path. Sci Rep. 2019;9(1):15325doi: 10.1038/s41598-019-51748-y.
Gorbunov, S. A., Rymzhanov, R. A., & Volkov, A. E. (2019). Dependence of track etching kinetics on chemical reactivity around the ion path. Scientific reports, 9(1), 15325. https://doi.org/10.1038/s41598-019-51748-y
Gorbunov, S A, et al. "Dependence of track etching kinetics on chemical reactivity around the ion path." Scientific reports vol. 9,1 (2019): 15325. doi: https://doi.org/10.1038/s41598-019-51748-y
Gorbunov SA, Rymzhanov RA, Volkov AE. Dependence of track etching kinetics on chemical reactivity around the ion path. Sci Rep. 2019 Oct 25;9(1):15325. doi: 10.1038/s41598-019-51748-y. PMID: 31653919; PMCID: PMC6814710.
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Sci Rep. 2019 Oct 25;9(1):15325. doi: 10.1038/s41598-019-51748-y.

Dependence of track etching kinetics on chemical reactivity around the ion path.

Scientific reports

S A Gorbunov, R A Rymzhanov, A E Volkov

Affiliations

  1. P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Leninskij pr. 53, 119991, Moscow, Russia. [email protected].
  2. Joint Institute for Nuclear Research, Joliot-Curie 6, 141980, Dubna, Moscow Region, Russia.
  3. The Institute of Nuclear Physics, Ibragimov St. 1, 050032, Almaty, Kazakhstan.
  4. P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Leninskij pr. 53, 119991, Moscow, Russia.
  5. National Research Centre 'Kurchatov Institute', Kurchatov Sq. 1, 123182, Moscow, Russia.
  6. National University of Science and Technology MISiS, Leninskij pr., 4, 119049, Moscow, Russia.

PMID: 31653919 PMCID: PMC6814710 DOI: 10.1038/s41598-019-51748-y

Abstract

Etching kinetics of swift heavy ions (SHI) tracks in olivine is investigated in frame of experimentally verified numerical approach. The model takes into account variation of induced chemical reactivity of the material around the whole ion trajectory with the nanometric accuracy. This enables a quantitative description of wet chemical etching of SHI tracks of different lengths and orientations towards to the sample surface. It is demonstrated that two different modes of etching, governed by diffusion of etchant molecules and by their reaction with the material must be observed in experiments using techniques with different resolution thresholds. Applicability limits of the optical microscopy for detection of heavy ion parameters by measuring of the lengthwise etching rates of the ion track are discussed.

References

  1. J Phys Chem B. 2011 Oct 27;115(42):12145-9 - PubMed
  2. Nanotechnology. 2019 Jul 5;30(27):274001 - PubMed

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